Belgium-based semiconductor research hub Imec has secured a highly advanced High Numerical Aperture extreme ultraviolet lithography machine from ASML, marking a major milestone in the race to develop next-generation chips. The system, valued at $400 million, is one of fewer than a dozen such machines available globally, underscoring its strategic importance in the semiconductor industry.
The acquisition significantly strengthens Imec’s position as a global leader in chip research and development, particularly in preparing advanced manufacturing technologies for commercial use. The High-NA EUV machine is designed to enable the production of much smaller and more powerful chip circuitry, which is critical for emerging technologies such as artificial intelligence and high-performance computing.
Industry players including Intel and SK Hynix are already preparing to use similar High-NA tools to manufacture next-generation AI logic and high-bandwidth memory chips as early as 2027. The adoption of this technology is expected to push the boundaries of chip performance while improving energy efficiency, making it a cornerstone for future digital infrastructure.
The newly acquired machine will serve as the centrepiece of Imec’s ambitious 2.5-billion-euro NanoIC pilot line, a large-scale research initiative supported by 1.4 billion euros in public funding, including contributions from the European Union’s Chips Act. The facility is designed as a collaborative platform where companies, researchers, and industry partners can access cutting-edge semiconductor tools and jointly develop next-generation manufacturing processes.
Imec operates on a unique model that allows shared access to advanced chipmaking infrastructure, enabling companies to test and validate new technologies in a factory-like environment. Through partnerships with major equipment manufacturers and chipmakers, the institute has become a central hub for integrating and refining semiconductor innovations before they are scaled for mass production.
The High-NA EUV technology represents a significant leap forward in lithography, the process used to “print” intricate circuit patterns onto silicon wafers. By increasing the numerical aperture, the system can produce chip features that are up to 66% smaller compared to earlier generations, allowing for faster and more efficient processors.
The move also carries broader geopolitical and economic implications, as Europe seeks to strengthen its position in the global semiconductor value chain. Imec’s leadership emphasized that securing such a rare and advanced tool reinforces Europe’s technological sovereignty and reduces reliance on external supply chains in an increasingly competitive global market.
ASML, the only company in the world capable of manufacturing EUV lithography systems, has played a central role in enabling the semiconductor industry’s progression toward smaller and more powerful chips. The deployment of High-NA EUV tools is widely seen as a critical step toward achieving sub-2 nanometre chip designs, which are expected to drive the next wave of innovation in AI, cloud computing, and advanced electronics.
The development comes at a time when global demand for advanced semiconductors is surging, fuelled by rapid advancements in artificial intelligence, data centres, and connected technologies. With the integration of the High-NA EUV system, Imec is poised to play a pivotal role in shaping the future of chip manufacturing and enabling breakthroughs that will define the next era of computing.
